SPIE Advanced Lithography is an internationally recognized forum for reporting state-of-the-art research and development in lithography. It brings together the lithography community from academia to current production engineers to solve challenges required by the seminconductor industry. Advanced Lithography features conferences, courses, and an exhibition where visitors can see the latest products and services on display, meet the people shaping the industry, and generate sales by connecting with qualified buyers. Thus the event delivers the right combination of practical know how and cutting-edge research.
The SPIE Advanced Lithography will take place on 5 days from Sunday, 25. February to Thursday, 01. March 2018 in San José.